{"id":"arxiv:2511.17474","kind":"article","title":"Residual Stress Anisotropy In Thin-Film Lithium Niobate For Stress-Managed MEMS","authors":["Byeongjin Kim","Ian Anderson","Tzu-Hsuan Hsu","Ziqian Yao","Mihir Chaudhari","Sinwoo Cho","Ruochen Lu"],"author_count":7,"year":2025,"published":"2025-11-21","venue":"IEEE International Conference on Micro Electro Mechanical Systems (MEMS)","cited_by":1,"doi":"10.1109/mems64181.2026.11419544","arxiv_id":"2511.17474","nct_id":null,"source_url":"https://arxiv.org/abs/2511.17474","archive_url":"https://space-kitty.com/papers/arxiv:2511.17474","updated":"2025-11-21","pmid":null,"pmcid":null,"openalex_id":"W4416599861","pdf_url":"https://arxiv.org/pdf/2511.17474","abstract":"In this work, we present the first experimental study of residual stress and post-release beam deflection in 128-degree Y-cut thin-film lithium niobate (TFLN) on Si, revealing pronounced stress anisotropy with in-plane orientation. Using optical profilometry with curvature fitting, we extract the stress gradient (sigma1) and generate orientation-resolved stress maps across multiple film thicknesses (100 nm, 220 nm, and 460 nm). For films in the 220 to 460 nm range, we identify stress-free in-plane orientations near approximately 55 degrees and 125 degrees, enabling extremely flat suspended beams. In contrast, ultra-thin 100 nm films exhibit shifted stress-free orientations near approximately 20 degrees and 160 degrees. Leveraging these orientations, we demonstrate very long suspended beams up to 2 cm in length, 10 micrometers in width, and 460 nm in thickness without collapse. These results establish in-plane stress anisotropy and thickness selection in TFLN as practical design levers for mechanically stable, scalable, and stress-managed microelectromechanical systems (MEMS).","abstract_license":"CC0-1.0 (arXiv descriptive metadata)","license":null,"is_open_access":false,"peer_reviewed":null,"categories":["physics.app-ph"],"details":null,"provenance":"arxiv","attribution":"Abstract: arXiv descriptive metadata (CC0). Thank you to arXiv for use of its open access interoperability. This service was not reviewed or approved by, nor does it necessarily express or reflect the policies or opinions of, arXiv.","topics":[{"slug":"metamaterials-photonics","name":"Metamaterials, Nanophotonics & Integrated Photonics","domain_slug":"materials"}],"cited_in_dossiers":[]}