# Cryogenic rf test of the first plasma etched SRF cavity

Preprint · J. Upadhyay, A. Palczewski, S. Popović, A. -M. Valente-Feliciano, D. Im, L. Phillips, L. Vušković

- Archive id: arxiv:1605.06494
- Published: 2016-05-20
- arXiv: https://arxiv.org/abs/1605.06494
- Citations: 0
- Source URL: https://arxiv.org/abs/1605.06494
- PDF: https://arxiv.org/pdf/1605.06494
- Provenance: arxiv

## Abstract

Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. This cavity is then plasma processed. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented.

_Abstract reproduced under CC0-1.0 (arXiv descriptive metadata)._

Topics: [Applied Superconductivity & HTS Magnets](https://space-kitty.com/topics/applied-superconductivity)

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