# Rapid quench annealing of Er implanted Si for quantum networking applications

Preprint · Mark A. Hughes, Huan Liu, Adam Brookfield, Tianrui Wang, Iain F. Crowe, Yaping Dan

- Archive id: arxiv:2408.09470
- Published: 2024-08-18
- arXiv: https://arxiv.org/abs/2408.09470
- Source URL: https://arxiv.org/abs/2408.09470
- PDF: https://arxiv.org/pdf/2408.09470
- Provenance: arxiv

## Abstract

Erbium implanted silicon (Er:Si) is a promising platform for quantum networking applications, but a major obstacle is the formation of multiple Er centres. We show that the previously identified cubic centre (Er-C) has C2v or lower symmetry. Using crystal field analysis of Er-C and other Er centres, and by comparison with extended X-ray absorption fine structure (EXAFS) measurements, we show that Er centres can be arranged in a sequence, ranging from entirely Si coordinated, through mixed Si and oxygen (O) coordination, to entirely O coordinated. G-factors calculated from our crystal field fitting closely match those determined by Zeeman splitting and electron paramagnetic resonance (EPR) measurements. We co-implanted Si with Er and O (each to a concentration of 1019 cm-3). By increasing the quenching rate of the subsequent thermal anneal from ~100 °C/s to ~1000 °C/s, we change the dominant optically active centre, formed from Er2O3 clusters to the less energetically favourable Er-C centre with mixed Si and O coordination. Temperature dependent photoluminescence (PL) shows that Er2O3 clusters and Er-C centres have an O-related defect state at ~200 and 90 meV above the 4I13/2 Er manifold, respectively. PL lifetime measurements show that the Er2O3 clusters and Er-C centres fall into two or three classes, characterised by different non-radiative PL decay rates. Our high quench rate annealing process could facilitate the formation of a single, optically active Er centre, which is preferable for quantum networking applications of Er:Si.

_Abstract reproduced under CC0-1.0 (arXiv descriptive metadata)._

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