# Centimetre-Scale Micro-Transfer Printing to enable Heterogeneous Integration of Thin Film Lithium Niobate with Silicon Photonics

Article · Margot Niels, Tom Vanackere, Tom Vandekerckhove, Stijn Poelman, Tom Reep, Günther Roelkens, Maximilien Billet, Bart Kuyken

- Archive id: arxiv:2412.15157
- Published: 2024-12-19
- Venue: Opt. Mater. Express 15, 531-540 (2025)
- DOI: https://doi.org/10.1364/ome.551748
- arXiv: https://arxiv.org/abs/2412.15157
- Citations: 18
- Source URL: https://arxiv.org/abs/2412.15157
- PDF: https://arxiv.org/pdf/2412.15157
- Provenance: arxiv

## Abstract

The integrated photonics CMOS-compatible silicon nitride (SiN) platform is praised for its low propagation loss, but is limited by its lack of active functionalities such as a strong Pockels coefficient and intrinsic \\c{hi}(2) nonlinearity. In this paper, we demonstrate the integration of centimetre-long thin-film lithium niobate (TFLN) devices on a SiN platform using the micro-transfer printing (uTP) method. At a wavelength of 1550 nm, propagation losses of approximately 0.9 dB/cm and transition losses of 1.8 dB per facet were measured. Furthermore, the TFLN was integrated into an imbalanced push-pull Mach-Zehnder modulator, achieving a Vπ of 3.2 V. The electro-optics nature of the observed modulation is confirmed by measuring the device up to 35 GHz, showing that the printing does not affect the high-speed LN properties.

_Abstract reproduced under CC0-1.0 (arXiv descriptive metadata)._

Topics: [Metamaterials, Nanophotonics & Integrated Photonics](https://space-kitty.com/topics/metamaterials-photonics)

Cited in dossiers:
- [Metamaterials, Nanophotonics & Integrated Photonics: State of the Field (October 2026)](https://space-kitty.com/dossiers/metamaterials-photonics)

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