# Residual Stress Anisotropy In Thin-Film Lithium Niobate For Stress-Managed MEMS

Article · Byeongjin Kim, Ian Anderson, Tzu-Hsuan Hsu, Ziqian Yao, Mihir Chaudhari, Sinwoo Cho, Ruochen Lu

- Archive id: arxiv:2511.17474
- Published: 2025-11-21
- Venue: IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
- DOI: https://doi.org/10.1109/mems64181.2026.11419544
- arXiv: https://arxiv.org/abs/2511.17474
- Citations: 1
- Source URL: https://arxiv.org/abs/2511.17474
- PDF: https://arxiv.org/pdf/2511.17474
- Provenance: arxiv

## Abstract

In this work, we present the first experimental study of residual stress and post-release beam deflection in 128-degree Y-cut thin-film lithium niobate (TFLN) on Si, revealing pronounced stress anisotropy with in-plane orientation. Using optical profilometry with curvature fitting, we extract the stress gradient (sigma1) and generate orientation-resolved stress maps across multiple film thicknesses (100 nm, 220 nm, and 460 nm). For films in the 220 to 460 nm range, we identify stress-free in-plane orientations near approximately 55 degrees and 125 degrees, enabling extremely flat suspended beams. In contrast, ultra-thin 100 nm films exhibit shifted stress-free orientations near approximately 20 degrees and 160 degrees. Leveraging these orientations, we demonstrate very long suspended beams up to 2 cm in length, 10 micrometers in width, and 460 nm in thickness without collapse. These results establish in-plane stress anisotropy and thickness selection in TFLN as practical design levers for mechanically stable, scalable, and stress-managed microelectromechanical systems (MEMS).

_Abstract reproduced under CC0-1.0 (arXiv descriptive metadata)._

Topics: [Metamaterials, Nanophotonics & Integrated Photonics](https://space-kitty.com/topics/metamaterials-photonics)

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