# Non-Fermi liquid behavior in La$_3$Ni$_2$O$_7$ thin films under hydrostatic pressure

Preprint · Deepak Kumar, Jared Z. Dans, Keenan E. Avers, Ryan Paxson, Ichiro Takeuchi, Johnpierre Paglione

- Archive id: arxiv:2603.26978
- Published: 2026-03-27
- Venue: Phys. Rev. B 114, 055128 (2026)
- DOI: https://doi.org/10.1103/zjnc-vv8p
- arXiv: https://arxiv.org/abs/2603.26978
- Source URL: https://arxiv.org/abs/2603.26978
- PDF: https://arxiv.org/pdf/2603.26978
- Provenance: arxiv

## Abstract

The discovery of superconductivity in bilayer nickel-oxides has revived an intense effort to understand the potential of high-temperature superconductivity in these materials and their relation to cuprate superconductors. In this work, we investigate the growth and properties of bilayer La$\_3$Ni$\_2$O$\_7$ thin films as a function of substrate, oxygen treatment and applied pressure in order to study the evolution of transport properties. We report epitaxial growth of La$\_3$Ni$\_2$O$\_7$ thin films on LaAlO$\_3$ (LAO) (001) and SrLaAlO$\_4$ (SLAO) (001) substrates, and the effects of ex-situ annealing in a high pressure furnace under an oxygen-rich environment. Transport measurements show that the La$\_3$Ni$\_2$O$\_7$ thin films on LAO(001) exhibit Fermi liquid-like metallic behavior with a slight Kondo-like upturn at low temperatures, which evolves with the application of modest hydrostatic pressures toward non-Fermi liquid behavior with a temperature dependence of resistance approaching $\\sim$ T$^{1.4}$ at 1.41 GPa. The ability to tune the normal state resistivity of La$\_3$Ni$\_2$O$\_7$ films to display non-Fermi liquid behavior under such a modest hydrostatic pressure range - only 6 - 8 % of that typically applied via diamond anvil cell (DAC) in La$\_3$Ni$\_2$O$\_7$ single crystals to achieve comparable effects - is both noteworthy and unexpected. These findings imply the strong tunability of La$\_3$Ni$\_2$O$\_7$ in thin film form and the likely proximity of a strongly fluctuating ordered state leading to non-Fermi liquid behavior under even modest applied pressures.

_Abstract reproduced under CC0-1.0 (arXiv descriptive metadata)._

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