# Reaction-induced Localized Annealing for On-chip Materials Discovery

Preprint · Nensi Toncich, Nerea Abando, Henning Galinski, Frans Spaepen, Ralph Spolenak

- Archive id: arxiv:2610.27355
- Published: 2026-10-19
- arXiv: https://arxiv.org/abs/2610.27355
- Citations: 0
- Source URL: https://arxiv.org/abs/2610.27355
- PDF: https://arxiv.org/pdf/2610.27355
- Provenance: arxiv

## Abstract

On-chip thermal processing is a key technology for materials discovery across all disciplines of the natural sciences. Here, we present a microfabricated heat-delivery platform that enables reaction-induced localized on-chip annealing up to 1400°C. A buried reactive multilayer combined with a nanometric diffusion barrier provide ultra-fast heating and quenching rates on the order of 10$^6$°C s$^{-1}$ as illustrated by the generation of ultra-high aspect ratio microstructures during rapid-solidification and the stabilization of dopant-free tetragonal zirconia at room temperature. Rapid kinetics also enable the observation of transient states of capillary-driven hole collapse in melts. Our work expands localized high-temperature processing routes and offers a material-independent approach for rapid screening of multidimensional nanomaterials on and off-equilibrium.

_Abstract reproduced under CC0-1.0 (arXiv descriptive metadata)._

Topics: [AI for Science](https://space-kitty.com/topics/ai-for-science), [Applied Superconductivity & HTS Magnets](https://space-kitty.com/topics/applied-superconductivity)

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