Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate
Yuan Ren, Boyang Nan, Rongbo Wu, Yong Zheng, Ruixue Liu, Yunpeng Song, Min Wang, Ya Cheng
Preprint: not peer reviewed. Results may change in later versions.
Abstract
We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
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Record
- Archive ID
- arxiv:2501.11843
- Published
- Jan 21, 2025
- arXiv
- 2501.11843
- Categories
- physics.optics, physics.app-ph
- Provenance
- arxiv